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Ion Beam Assisted Deposition Evaporation Optical Coater

Ion Beam Assisted Deposition Evaporation Optical Coater

This is high-end equipment for the preparation of ultra-high precision optoelectronic devices. Focusing on high-quality optical coating, it has extremely low scattering value and defect density. Suitable for high-precision coating production in demanding applications such as laser, optical communication, aerospace, biomedical, automotive optics, MEMS sensors, and pan semiconductors.
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Ion Beam Assisted Deposition Evaporation Optical Coater

Application

Blue glass & white glass IR- CUT, blue glass & white glass AR, resin lens AR, periscope right angle prism, etc.

Features
  • Mass production standard machine
  • Real-time online monitor
  • Fully autonomous optical control
  • Open process design
  • RISE RF ion source: ion beam current is precise and controllable, with long continuous working time, suitable for various working gases, and pollution-free to the film layer.
  • Unique plasma source: radio frequency drive, consumable-free operation, providing pure oxygen ions, ensuring excellent spectral indicators in specific bands.
  • Light controlled: Light controlled film forming control accuracy: 0.1-0.3%, with a unique structure and efficient optical path design, real-time collection of ultra-high-speed spectral data, and independently developed intelligent light-controlled core algorithm.
  • Innovative control system: Open modular system architecture, a smart control system based on ARM, friendly human-machine interaction experience, supporting IoT and cloud computing architecture.
Features

Model

OPIE1550

Vacuum room

SUS304, φ1550mmx1600mm(H)

Vacuum system

4 molecular pumps +1 set of mechanical pump/ roots pump unit

Workpiece rack
and workpiece disc

workpiece disc diameter 1460mm, rotary speed 0-30 rpm

Steam source

2 Sets of electronic guns (dual guns, dual scanning, dual filaments, 270-degree beam deviation angle, power 10KW)

Deposition system

RISE radio frequency ion source + special plasma source (optional)

Control system

Vacuum deposition intelligent control system

Monitoring system

The crystal film thickness monitoring system

configured according to specific requirements, standard configuration

Optical thin film real-time monitoring system

self-developed optical control system (wide spectrum, single wavelength) optional

Deep cooling system

compressor power 10KW, coil cooling temperature<-130°C

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